Welcome to Journal of Microelectronic Manufacturing!
2020
Volume 3, Issue 3
  • Published: Oct. 29, 2020
  • Supervised by:None
  • Hosted by:None
  • Published by:JoMM Editorial Office

top

Recent Progress of the Integrated Circuit Industry in China ― Overview of the Manufacturing Industry
Authors: Litho World
Keywords:IC Industry;Manufacturing Industry
doi:10.33079/jomm.20030304
Issue 3: 20030304, 2020 | PDF
Published: Oct. 8, 2020
Views:164
Abstract: China's IC industry has been flourishing in recent years, huge market demand together with government investments are the major driving forces for this development. The status and development momen...

Research Article top

Study on Simulation and Profile Prediction of Atomic Layer Deposition
Authors: Lei Qu, Chen Li, Jiang Yan et al.
Institution:North China University of Technology
Keywords:Atomic Layer Deposition;process simulation;profile model;temperature fitting;film of HfO2
doi:10.33079/jomm.20030303
Issue 3: 20030303, 2020 | PDF
Research Article
Published: Oct. 8, 2020
Views:167
Abstract: The Atomic Layer Deposition process (ALD) is widely used in FinFET, 3D-NAND and other important technologies because of its self-limiting signature and low growth temperature. In recent years, the ...
Recognition and Visualization of Lithography Defects based on Transfer Learning
Authors: Bo Liu, Pengzheng Gao, Libin Zhang et al.
Institution:School of Information, North China University of Technology, Beijing
Keywords:transfer learning;neural network;lithography defects;visualize;Grad-CAM
doi:10.33079/jomm.20030302
Issue 3: 20030302, 2020 | PDF
Research Article
Published: Oct. 5, 2020
Views:210
Abstract: Yield control in the integrated circuit manufacturing process is very important, and defects are one of the main factors affecting chip yield. As the process control becomes more and more critical ...
Study of Inverse Lithography Approaches based on Deep Learning
Authors: Xianqiang Zheng, Xu Ma, Shengen Zhang et al.
Institution:Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China, School of Optics and Photonics, Beijing Institute of Technology, China
Keywords:Computational lithography;inverse lithography technology (ILT);optical proximity correction (OPC);deep learning
doi:10.33079/jomm.20030301
Issue 3: 20030301, 2020 | PDF
Research Article
Published: Oct. 7, 2020
Views:251
Abstract: Computational lithography (CL) has become an indispensable technology to improve imaging resolution and fidelity of deep sub-wavelength lithography. The state-of-the-art CL approaches are capable o...