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CN: DemoJournal-CN
ISSN: DemoJournal-ISSN
Research Article Archive • Versions 3 Vol 2 (3) : 19020406 2019
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A Simulation Study for Typical Design Rule Patterns in 5 nm Logic Process with EUV Photolithographic Process
Yanli Li, Qiang Wu, Shoumian Chen
Received： 2019 - 10 - 17
Published： 2019 - 12 - 25
3078 43 0
CSCD  ·  Baidu Scholar
References
Journal of Microelectronic Manufacturing

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