TY  - JOUR
Du Zhang; Yu-Hao Tsai; Hojin Kim; Mingmei WangT1  - Nitridation-Etch of Silicon Oxide in Fluorocarbon/Nitrogen Plasma: A Computational Study
JO  - Journal of Microelectronic Manufacturing
VL  - 2
Y1  - 
UR  - http://www.jommpublish.org/p/183/24/
L1  - http://www.jommpublish.org/jomm_data/publish/73/7D/5D/F40B7A4DF2BDF6FFD82C6D7CC7/10.33079.jomm.19020103.pdf
DO  - 10.33079/jomm.19020103
ER  -