@Article{jomm.20030103,
AUTHOR = {Yushu Yang; Yanli Li; Qiang Wu; Jianjun Zhu; Shoumian Chen},
TITLE = {Key Process Approach Recommendation for 5 nm Logic Process Flow with EUV Photolithography},
JOURNAL = {Journal of Microelectronic Manufacturing},
VOLUME = {3},
YEAR = {2020},
PAGES = {20030103},
URL = {http://www.jommpublish.org/p/183/48/},
DOI = {10.33079/jomm.20030103}
}